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Conference Paper
Nanophotonics for Information Systems
San Diego, California United States
April 13, 2005
ISBN: 1-55752-787-3
Silicon Nanophotonics (NWB)

Design, Fabrication and Characterization of Artificial Dielectrics for Polarization Transformations and Beam Shaping Applications

Uriel Levy, Chia Ho. Tsai, Hyu Chang. Kim, Lin Pang, and Yeshaiahu Fainman

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Abstract

We report the design, fabrication and characterization of artificial dielectric components for polarization transformations and beam shaping applications. The devices are realized by deep etching of subwavelength gratings with space variant orientation into semiconductor substrate.

© 2005 Optical Society of America

OCIS Codes
(050.0050) Diffraction and gratings : Diffraction and gratings
(050.1970) Diffraction and gratings : Diffractive optics
(260.0260) Physical optics : Physical optics
(260.5430) Physical optics : Polarization

Citation
U. Levy, C. H. Tsai, H. C. Kim, L. Pang, and Y. Fainman, " Design, Fabrication and Characterization of Artificial Dielectrics for Polarization Transformations and Beam Shaping Applications," in Integrated Photonics Research and Applications/Nanophotonics for Information Systems, Technical Digest (Optical Society of America, 2005), paper NWB5.
http://www.opticsinfobase.org/abstract.cfm?URI=NPIS-2005-NWB5


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