OSA's Digital Library

Optics InfoBase > Conference Papers > OIC > 2001 > MB > Page MB2 © 2001 OSA

Conference Paper
Optical Interference Coatings
Banff Canada
July 15, 2001
ISBN: 1-55752-682-6
Deposition of Optical Coatings II (MB)

Ta2O5 and SiO2 films deposited by dual ion beam system with ECR source

Chang-Yeng Huang, M.C. Shih, D. Lin, M.S. Wu, C.S. Chang, J.H. Dai, and F.C. Ho

http://dx.doi.org/10.1364/OIC.2001.MB2


View Full Text Article

Acrobat PDF (68 KB) Note that full-text PDFs from conferences typically contain 1-3 pages of content, some or all of which might be an abstract, summary, or miscellaneous items.





Browse Journals / Lookup Meetings

Browse by Journal and Year


   


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools

Share
Citations
  • Export Citation/Save Click for help

Abstract

Ta2O5 and SiO2 films deposited by dual ion beam system with ECR source

© 2001 Optical Society of America

OCIS Codes
(120.2440) Instrumentation, measurement, and metrology : Filters
(310.0310) Thin films : Thin films

Citation
C. Huang, M. C. Shih, D. Lin, M. S. Wu, C. S. Chang, J. H. Dai, and F. C. Ho, " Ta2O5 and SiO2 films deposited by dual ion beam system with ECR source," in Optical Interference Coatings, OSA Technical Digest Series (Optical Society of America, 2001), paper MB2.
http://www.opticsinfobase.org/abstract.cfm?URI=OIC-2001-MB2


Sort:  Journal  |  Reset

References

References are not available for this paper.

OSA is a member of CrossRef.

CrossCheck Deposited