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In-situ Ellipsometry and in-situ Raman thin film growth monitoring

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Abstract

Fast and reliable optical in-situ process diagnostics by spectroscopic ellipsometry and Raman scattering spectroscopy is demonstrated. Applications include design and control of dielectric multilayer mirros for soft-x-ray applications and solar cell absorber layers deposited within a roll-to-roll system.

© 2004 Optical Society of America

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