Abstract
Fast and reliable optical in-situ process diagnostics by spectroscopic ellipsometry and Raman scattering spectroscopy is demonstrated. Applications include design and control of dielectric multilayer mirros for soft-x-ray applications and solar cell absorber layers deposited within a roll-to-roll system.
© 2004 Optical Society of America
PDF ArticleMore Like This
Robert W. Collins
MA3 Microphysics of Surfaces, Beams, and Adsorbates (MSBA) 1989
Eike Lüken, Eric Ziegler, Peter Høghøj, Andreas Freund, Erich Gerdau, and Alain Fontaine
MB.3 Physics of X-Ray Multilayer Structures (PXRAYMS) 1994
R.P. Netterfield, P.J. Martin, K.-H. Müller, W.G. Sainty, C.G. Pacey, and S.W. Filipczuk
TuC1 Optical Interference Coatings (OIC) 1988