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Optimization of electron-beam deposition uniformity for large aperture NIF substrates in a planetary rotation system

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Abstract

Optimization of optical-thin-film uniformity for 0.9-m-aperture optics in a 72-in. coating chamber is achieved for a planetary rotation through analysis of source placement, planetary gearing, and mask design. Consideration is made for efficiency of source material utilization, resulting in achieved deposition nonuniformity of less than 0.5%.

© 2004 Optical Society of America

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