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Conference Paper
Optical Interference Coatings
Tucson, Arizona United States
June 27, 2004
ISBN: 3-5400-0364-9
Deposition of Optical Coatings II (MB)

Optimization of electron-beam deposition uniformity for large aperture NIF substrates in a planetary rotation system

James B. Oliver and David M. Talbot

http://dx.doi.org/10.1364/OIC.2004.MB4


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Abstract

Optical-thin-film uniformity for 0.9-m-aperture optics in a 72-in. coating chamber is optimized for planetary rotation by analyzing source placement, planetary gearing, and mask design. Source efficiency is considered in achieving deposition nonuniformity of approximately 0.5%.

© 2004 Optical Society of America

OCIS Codes
(310.0310) Thin films : Thin films
(310.1860) Thin films : Deposition and fabrication
(310.3840) Thin films : Materials and process characterization

Citation
J. B. Oliver and D. M. Talbot, " Optimization of electron-beam deposition uniformity for large aperture NIF substrates in a planetary rotation system," in Optical Interference Coatings, OSA Technical Digest Series (Optical Society of America, 2004), paper MB4.
http://www.opticsinfobase.org/abstract.cfm?URI=OIC-2004-MB4


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