Optical-thin-film uniformity for 0.9-m-aperture optics in a 72-in. coating chamber is optimized for planetary rotation by analyzing source placement, planetary gearing, and mask design. Source efficiency is considered in achieving deposition nonuniformity of approximately 0.5%.
© 2004 Optical Society of America
J. B. Oliver and D. M. Talbot, " Optimization of electron-beam deposition uniformity for large aperture NIF substrates in a planetary rotation system," in Optical Interference Coatings, OSA Technical Digest Series (Optical Society of America, 2004), paper MB4.
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