We study the growth of glancing angle deposited films using in situ spectroscopic ellipsometry for the first time. Our results should improve our future ability to control the fabrication of photonic interference filters.
© 2004 Optical Society of America
(120.0120) Instrumentation, measurement, and metrology : Instrumentation, measurement, and metrology
(120.2130) Instrumentation, measurement, and metrology : Ellipsometry and polarimetry
(310.0310) Thin films : Thin films
(310.6860) Thin films : Thin films, optical properties
K. Kaminska, A. Amassian, L. Martinu, and K. Robbie, " Growth study of ultra-porous silicon for photonic interference filters," in Optical Interference Coatings, OSA Technical Digest Series (Optical Society of America, 2004), paper MF4.
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