An ST 2000 Pulsed Ion Source was applied to produce optical thin films of MgF2 and LaF3 for the VIS and NUV. In situ film growth studies, contamination, optical parameters and environmental stability are discussed.
© 2004 Optical Society of America
H. Niederwald, H. Ehlers, S. Günster, and D. Ristau, " Physical vapor deposition of fluoride coatings using a pulsed ion source," in Optical Interference Coatings, OSA Technical Digest Series (Optical Society of America, 2004), paper WF2.
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