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Conference Paper
Optical Interference Coatings
Tucson, Arizona United States
June 27, 2004
ISBN: 3-5400-0364-9
Short and Intense Wavelength Coatings (WF)

Physical vapor deposition of fluoride coatings using a pulsed ion source

Hansjoerg Niederwald, Henrik Ehlers, Stephan Günster, and Detlev Ristau


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An ST 2000 Pulsed Ion Source was applied to produce optical thin films of MgF2 and LaF3 for the VIS and NUV. In situ film growth studies, contamination, optical parameters and environmental stability are discussed.

© 2004 Optical Society of America

OCIS Codes
(160.0160) Materials : Materials
(160.4670) Materials : Optical materials
(310.0310) Thin films : Thin films
(310.6860) Thin films : Thin films, optical properties

H. Niederwald, H. Ehlers, S. Günster, and D. Ristau, " Physical vapor deposition of fluoride coatings using a pulsed ion source," in Optical Interference Coatings, OSA Technical Digest Series (Optical Society of America, 2004), paper WF2.

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