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Conferences > OIC > 2007 > FB > FB3

Laser damage resistance of HfO2 thin films deposited by Electron Beam Deposition, Reactive Low Voltage Ion Plating and Dual Ion Beam Sputtering

L. Gallais, J. Capoulade, J.Y. Natoli, M. Commandré, M. Cathelinaud, C. Koc, and M. Lequime

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Abstract

We study the laser damage resistance at 1064 and 355nm of HfO2 thin films deposited by three different processes in various conditions. We compare their Laser Induced Damage Threshold obtained trough several measurement procedures.

© 2007 Optical Society of America

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