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Conferences > OIC > 2007 > ThB > ThB5

Stoichiometry monitor in plasma assisted deposition using optical spectroscopy

Oscar Raymond, J. Salinas, J. Camacho, Manuel Guevara, and Roberto Machorro

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Abstract

A simple procedure to monitor the chemical stoichiometry during the plasma assisted deposition processes is presented. With this technique a better control of the deposition parameters is obtained. A direct observation of some predefined spectral lines allows a predictable layer composition.

© 2007 Optical Society of America

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