OSA's Digital Library

Optics InfoBase > Conference Papers > OIC > 2007 > ThD > Page ThD9 © 2007 OSA

Conference Paper
Optical Interference Coatings
Tucson, Arizona United States
June 3, 2007
ISBN: 1-55752-841-1
Applications II / Antireflection Coatings (ThD)

Preparation of MgF2-SiO2 Thin Films with Low Refractive Index by Sol-gel Process

Hitoshi Ishizawa, T Murata, and A Tanaka


View Full Text Article

Acrobat PDF (131 KB) Note that full-text PDFs from conferences typically contain 1-3 pages of content, some or all of which might be an abstract, summary, or miscellaneous items.

Browse Journals / Lookup Meetings

Browse by Journal and Year


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools

  • Export Citation/Save Click for help


Porous MgF2-SiO2 films with low refractive index of 1.26 were made by sol-gel process. The film was consisted of MgF2 particles and SiO2 binder connecting them. The refractive index was variable with the processing conditions.

© 2007 Optical Society of America

OCIS Codes
(310.0310) Thin films : Thin films
(310.1210) Thin films : Antireflection coatings
(310.3840) Thin films : Materials and process characterization

H. Ishizawa, T. Murata, and A. Tanaka, " Preparation of MgF2-SiO2 Thin Films with Low Refractive Index by Sol-gel Process," in Optical Interference Coatings, OSA Technical Digest (CD) (Optical Society of America, 2007), paper ThD9.

Sort:  Journal  |  Reset


References are not available for this paper.

OSA is a member of CrossRef.

CrossCheck Deposited