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Conference Paper
Optical Interference Coatings
Tucson, Arizona United States
June 3, 2007
ISBN: 1-55752-841-1
Design of Optical Coatings I (WA)

Design of Attenuated Phase-shift Masks for Extreme Ultraviolet Lithography with High Inspection Contrast in Deep Ultraviolet Regime

Hee Young Kang, Jang-Hoon Lee, and Chang Kwon Hwangbo

http://dx.doi.org/10.1364/OIC.2007.WA10


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Abstract

Attenuated phase-shift masks based on a Fabry-Perot interferometer for extreme ultraviolet lithography have designed, which show not only 180° phase-shift with attenuated reflectance ratio below 0.1 at 13.5-nm, but also high inspection contrast at 257-nm.

© 2007 Optical Society of America

OCIS Codes
(050.0050) Diffraction and gratings : Diffraction and gratings
(050.5080) Diffraction and gratings : Phase shift
(220.0220) Optical design and fabrication : Optical design and fabrication
(220.3740) Optical design and fabrication : Lithography

Citation
H. Y. Kang, J. Lee, and C. K. Hwangbo, " Design of Attenuated Phase-shift Masks for Extreme Ultraviolet Lithography with High Inspection Contrast in Deep Ultraviolet Regime," in Optical Interference Coatings, OSA Technical Digest (CD) (Optical Society of America, 2007), paper WA10.
http://www.opticsinfobase.org/abstract.cfm?URI=OIC-2007-WA10


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