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Conference Paper
Optical Interference Coatings
Tucson, Arizona United States
June 6-11, 2010
ISBN: 978-1-55752-891-9
Manufacturing Contest and Large Area Coatings (MB)

Large-Aperture Plasma-Assisted Deposition of ICF Laser Coatings

James B. Oliver, Pete Kupinski, Amy L. Rigatti, Ansgar W. Schmid, John C. Lambropoulos, Semyon Papernov, Alexei Kozlov, John Spaulding, Daniel Sadowski, Roman Chrzan, Robert Hand, Desmond R. Gibson, Ian Brinkley, and Frank Placido


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Plasma-assisted electron-beam evaporation leads to changes in the crystallinity, density and stresses of thin films. A dual-source plasma system provides stress control of large-aperture, high-fluence coatings used in vacuum for substrates 1 m in aperture.

© 2010 The Optical Society

OCIS Codes
(310.0310) Thin films : Thin films
(310.1860) Thin films : Deposition and fabrication
(310.4925) Thin films : Other properties (stress, chemical, etc.)

J. B. Oliver, P. Kupinski, A. L. Rigatti, A. W. Schmid, J. C. Lambropoulos, S. Papernov, A. Kozlov, J. Spaulding, D. Sadowski, R. Chrzan, R. Hand, D. R. Gibson, I. Brinkley, and F. Placido, "Large-Aperture Plasma-Assisted Deposition of ICF Laser Coatings," in Optical Interference Coatings, OSA Technical Digest (Optical Society of America, 2010), paper MB7.

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