Plasma-assisted electron-beam evaporation leads to changes in the crystallinity, density and stresses of thin films. A dual-source plasma system provides stress control of large-aperture, high-fluence coatings used in vacuum for substrates 1 m in aperture.
© 2010 The Optical Society
J. B. Oliver, P. Kupinski, A. L. Rigatti, A. W. Schmid, J. C. Lambropoulos, S. Papernov, A. Kozlov, J. Spaulding, D. Sadowski, R. Chrzan, R. Hand, D. R. Gibson, I. Brinkley, and F. Placido, "Large-Aperture Plasma-Assisted Deposition of ICF Laser Coatings," in Optical Interference Coatings, OSA Technical Digest (Optical Society of America, 2010), paper MB7.
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