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Conference Paper
Optical Interference Coatings
Tucson, Arizona United States
June 6-11, 2010
ISBN: 978-1-55752-891-9
UV (MD)

Laterally Graded Mo/Si Multilayer for a 5 Steradian EUV Collector

Marco Perske, Hagen Pauer, Sergiy Yulin, Viatcheslav Nesterenko, Mark Schürmann, Torsten Feigl, and Norbert Kaiser

http://dx.doi.org/10.1364/OIC.2010.MD3


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Abstract

The deposition of laterally graded Mo/Si multilayers for EUV collector optics is one of the key challenges to bring EUV Lithography to high volume manufacturing. Coating results of the world’s largest EUV collector are presented.

© 2010 The Optical Society

OCIS Codes
(310.0310) Thin films : Thin films
(310.1620) Thin films : Interference coatings
(340.0340) X-ray optics : X-ray optics
(340.7480) X-ray optics : X-rays, soft x-rays, extreme ultraviolet (EUV)

Citation
M. Perske, H. Pauer, S. Yulin, V. Nesterenko, M. Schürmann, T. Feigl, and N. Kaiser, "Laterally Graded Mo/Si Multilayer for a 5 Steradian EUV Collector," in Optical Interference Coatings, OSA Technical Digest (Optical Society of America, 2010), paper MD3.
http://www.opticsinfobase.org/abstract.cfm?URI=OIC-2010-MD3


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