The deposition of laterally graded Mo/Si multilayers for EUV collector optics is one of the key challenges to bring EUV Lithography to high volume manufacturing. Coating results of the world’s largest EUV collector are presented.
© 2010 The Optical Society
(310.0310) Thin films : Thin films
(310.1620) Thin films : Interference coatings
(340.0340) X-ray optics : X-ray optics
(340.7480) X-ray optics : X-rays, soft x-rays, extreme ultraviolet (EUV)
M. Perske, H. Pauer, S. Yulin, V. Nesterenko, M. Schürmann, T. Feigl, and N. Kaiser, "Laterally Graded Mo/Si Multilayer for a 5 Steradian EUV Collector," in Optical Interference Coatings, OSA Technical Digest (Optical Society of America, 2010), paper MD3.
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