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Design and Fabrication of Multi-channel Si/SiO2 Autocloned Photonic Crystal Edge Filters

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Abstract

Si/SiO2 alternating layers having zigzag layer interfaces are fabricated on a silica substrate with surface gratings using the autocloning method. The multilayer was designed to function as long-wave pass type edge filters with various cut-off wavelengths. The shift of the cut-off wavelength of the order of 190nm in NIR (near infrared) was experimentally demonstrated.

© 2010 Optical Society of America

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