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Conference Paper
Optical Interference Coatings
Tucson, Arizona United States
June 6-11, 2010
ISBN: 978-1-55752-891-9
Measurement II (ThD)

Instrument for Close-to-Process Light Scatter Measurements of Thin Film Coatings and Substrates

Alexander von Finck, Matthias Hauptvogel, and Angela Duparré

http://dx.doi.org/10.1364/OIC.2010.ThD4


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Abstract

Scatter analysis is an effective method for characterization of thin film components. For flexible and easy use in research and industry the high-sensitive table-top system ALBATROSS-TT with full 3-D-spherical measurement capability has been developed.

© 2010 The Optical Society

OCIS Codes
(120.0120) Instrumentation, measurement, and metrology : Instrumentation, measurement, and metrology
(120.5820) Instrumentation, measurement, and metrology : Scattering measurements
(240.0240) Optics at surfaces : Optics at surfaces
(240.5770) Optics at surfaces : Roughness

Citation
A. von Finck, M. Hauptvogel, and A. Duparré, "Instrument for Close-to-Process Light Scatter Measurements of Thin Film Coatings and Substrates," in Optical Interference Coatings, OSA Technical Digest (Optical Society of America, 2010), paper ThD4.
http://www.opticsinfobase.org/abstract.cfm?URI=OIC-2010-ThD4

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