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Conference Paper
Optical Interference Coatings
Tucson, Arizona United States
June 6-11, 2010
ISBN: 978-1-55752-891-9
Photonic Structure and Plasma-Polymerized Films (WB)

Measurement of the Deformation of Silicon Substrates Coated with a Plasma-Polymerized Acrylonitrile Film

David P. Sisler, Jr., Vincent P. Tondiglia, Hao Jiang, Jesse O. Enlow, and Rachel Jakubiak


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A sensitive interferometric method is employed to quantify the deformation of silicon substrates coated with thin plasma-polymerized acrylonitrile film deposited at room temperature. This provides insight into the structural variation of plasma polymerized films.

© 2010 The Optical Society

OCIS Codes
(310.0310) Thin films : Thin films
(310.3840) Thin films : Materials and process characterization
(310.4925) Thin films : Other properties (stress, chemical, etc.)

D. P. Sisler, Jr., V. P. Tondiglia, H. Jiang, J. O. Enlow, and R. Jakubiak, "Measurement of the Deformation of Silicon Substrates Coated with a Plasma-Polymerized Acrylonitrile Film," in Optical Interference Coatings, OSA Technical Digest (Optical Society of America, 2010), paper WB7.

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