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Conference Paper
Optical Interference Coatings
Tucson, Arizona United States
June 6-11, 2010
ISBN: 978-1-55752-891-9
Polarization (WC)

Polarization Beam Splitters with Autocloned Symmetric Structure

Sheng-Hui Chen, Chun-Hung Wang, Kwang-Yao Chai, Te-Hung Chang, Yu-Wen Yeh, Cheng-Chung Lee, Shih-Liang Ku, and Chao-Chun Huang

http://dx.doi.org/10.1364/OIC.2010.WC4


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Abstract

We fabricated TiO2/SiO22-D polarization beam splitters using electron beam gun evaporation with ion-beam-assisted deposition. Symmetric structure designs have been applied to reduce ripples and achieve 200 nm of working range.

© 2010 The Optical Society

OCIS Codes
(310.0310) Thin films : Thin films
(310.1860) Thin films : Deposition and fabrication
(310.6628) Thin films : Subwavelength structures, nanostructures

Citation
S. Chen, C. Wang, K. Chai, T. Chang, Y. Yeh, C. Lee, S. Ku, and C. Huang, "Polarization Beam Splitters with Autocloned Symmetric Structure," in Optical Interference Coatings, OSA Technical Digest (Optical Society of America, 2010), paper WC4.
http://www.opticsinfobase.org/abstract.cfm?URI=OIC-2010-WC4


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