Planarizing nodular defects with angle-dependent ion etching and uniform deposition increased the 1064 nm laser resistance of optical interference mirror coatings by greater than 20×.
© 2013 OSA
C. J. Stolz, J. E. Wolfe, P. B. Mirkarimi, J. A. Folta, J. A. Adams, M. G. Menor, N. E. Teslich, R. Soufli, C. S. Menoni, and D. Patel, "Nodular defect planarization for improved multilayer mirror laser resistance," in Optical Interference Coatings, M. Tilsch and D. Ristau, eds., OSA Technical Digest (online) (Optical Society of America, 2013), paper FA.1.