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Optics InfoBase > Conference Papers > OIC > 2013 > FA > Page FA.1 © 2013 OSA

Conference Paper
Optical Interference Coatings
Whistler Canada
June 16-21, 2013
ISBN: 978-1-55752-970-1
LIDT I: Defects and Materials (FA)

Nodular defect planarization for improved multilayer mirror laser resistance

Christopher J. Stolz, Justin E. Wolfe, Paul B. Mirkarimi, James A. Folta, John A. Adams, Marlon G. Menor, Nick E. Teslich, Regina Soufli, Carmen S. Menoni, and Dinesh Patel  »View Author Affiliations


http://dx.doi.org/10.1364/OIC.2013.FA.1


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Abstract

Planarizing nodular defects with angle-dependent ion etching and uniform deposition increased the 1064 nm laser resistance of optical interference mirror coatings by greater than 20×.

© 2013 OSA

OCIS Codes
(140.3330) Lasers and laser optics : Laser damage
(230.4040) Optical devices : Mirrors
(240.0310) Optics at surfaces : Thin films

Citation
C. J. Stolz, J. E. Wolfe, P. B. Mirkarimi, J. A. Folta, J. A. Adams, M. G. Menor, N. E. Teslich, R. Soufli, C. S. Menoni, and D. Patel, "Nodular defect planarization for improved multilayer mirror laser resistance," in Optical Interference Coatings, M. Tilsch and D. Ristau, eds., OSA Technical Digest (online) (Optical Society of America, 2013), paper FA.1.
http://www.opticsinfobase.org/abstract.cfm?URI=OIC-2013-FA.1

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