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Conference Paper
Optical Interference Coatings
Whistler Canada
June 16-21, 2013
ISBN: 978-1-55752-970-1
UV-EUV Coatings (FC)

Optical Properties of High Absorption Films for Binary Masks in Extreme Ultraviolet Lithography

Hee Young Kang, Sungjin Park, Jai Dong Lim, Pazhanisami Peranantham, and Chang Kwon Hwangbo  »View Author Affiliations


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We studied telluride compounds and transparent conductive oxides as high absorption materials for binary masks of extreme ultraviolet lithography at 13.5-nm wavelength. Their optical and structural properties are described.

© 2013 OSA

OCIS Codes
(120.4530) Instrumentation, measurement, and metrology : Optical constants
(310.6860) Thin films : Thin films, optical properties
(340.7480) X-ray optics : X-rays, soft x-rays, extreme ultraviolet (EUV)

H. Y. Kang, S. Park, J. D. Lim, P. Peranantham, and C. K. Hwangbo, "Optical Properties of High Absorption Films for Binary Masks in Extreme Ultraviolet Lithography," in Optical Interference Coatings, M. Tilsch and D. Ristau, eds., OSA Technical Digest (online) (Optical Society of America, 2013), paper FC.1.

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