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Conference Paper
Optical Interference Coatings
Whistler Canada
June 16-21, 2013
ISBN: 978-1-55752-970-1
UV-EUV Coatings (FC)

Zr/Mg multilayer mirror for extreme ultraviolet application

Jingtao Zhu, Haochuan Li, Sika Zhou, Zhanshan Wang, Philippe Jonnard, and Karine Guen  »View Author Affiliations


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A novel Zr/Mg multilayer mirror for extreme ultraviolet (EUV) spectral range was proposed and deposited by magnetron sputtering. The near-normal-incidence reflectance is 30.6% at wavelength λ=30.4 nm (He-II emission line).

© 2013 OSA

OCIS Codes
(230.4170) Optical devices : Multilayers
(340.6720) X-ray optics : Synchrotron radiation
(340.7480) X-ray optics : X-rays, soft x-rays, extreme ultraviolet (EUV)

J. Zhu, H. Li, S. Zhou, Z. Wang, P. Jonnard, and K. Guen, "Zr/Mg multilayer mirror for extreme ultraviolet application," in Optical Interference Coatings, M. Tilsch and D. Ristau, eds., OSA Technical Digest (online) (Optical Society of America, 2013), paper FC.2.

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