Influence of coating parameters on the efficiency in a modified IBS Process

Sina Malobabic; Sina Malobabic; Marco Jupé; Marco Jupé; Detlev Ristau; Detlev Ristau

doi:10.1364/OIC.2013.ThB.4

Optical Interference Coatings
OSA Technical Digest (online) (Optica Publishing Group, 2013),
paper ThB.4
•https://doi.org/10.1364/OIC.2013.ThB.4

Influence of coating parameters on the efficiency in a modified IBS Process

Sina Malobabic, Marco Jupé, and Detlev Ristau

Optical Interference Coatings 2013

Whistler Canada
16–21 June 2013
ISBN: 978-1-55752-970-1

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Sputter Deposition (ThB)

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S. Malobabic, M. Jupé, and D. Ristau, "Influence of coating parameters on the efficiency in a modified IBS Process," in Optical Interference Coatings, M. Tilsch and D. Ristau, eds., OSA Technical Digest (online) (Optica Publishing Group, 2013), paper ThB.4.

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Abstract

An electromagnetic field guiding device was implemented into an Ion Beam Sputtering (IBS) process. The EM-field causes higher deposition rates on the substrate. The efficiency of the guidance could be improved by optimization of the plasma conditions.

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