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Optics InfoBase > Conference Papers > OIC > 2013 > ThB > Page ThB.8 © 2013 OSA

Conference Paper
Optical Interference Coatings
Whistler Canada
June 16-21, 2013
ISBN: 978-1-55752-970-1
Sputter Deposition (ThB)

Small Batch High Throughput Plasma Activated Magnetron Sputtering System

Desmond Gibson, Jerry Martin, Frank Placido, and David Childs  »View Author Affiliations


http://dx.doi.org/10.1364/OIC.2013.ThB.8


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Abstract

Magnetron sputtering offers a flexible and high throughput deposition process for optical coatings. Sputtering uses two or more metal targets, depositing multilayers comprising dielectrics, metals and conductive oxides.

© 2013 OSA

OCIS Codes
(310.1860) Thin films : Deposition and fabrication
(310.3840) Thin films : Materials and process characterization
(310.6860) Thin films : Thin films, optical properties

Citation
D. Gibson, J. Martin, F. Placido, and D. Childs, "Small Batch High Throughput Plasma Activated Magnetron Sputtering System," in Optical Interference Coatings, M. Tilsch and D. Ristau, eds., OSA Technical Digest (online) (Optical Society of America, 2013), paper ThB.8.
http://www.opticsinfobase.org/abstract.cfm?URI=OIC-2013-ThB.8


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