OSA's Digital Library

Optics InfoBase > Conference Papers > OIC > 2013 > ThB > Page ThB.8 © 2013 OSA

Conference Paper
Optical Interference Coatings
Whistler Canada
June 16-21, 2013
ISBN: 978-1-55752-970-1
Sputter Deposition (ThB)

Small Batch High Throughput Plasma Activated Magnetron Sputtering System

Desmond Gibson, Jerry Martin, Frank Placido, and David Childs  »View Author Affiliations


View Full Text Article

Acrobat PDF (458 KB) Note that full-text PDFs from conferences typically contain 1-3 pages of content, some or all of which might be an abstract, summary, or miscellaneous items.

Browse Journals / Lookup Meetings

Browse by Journal and Year


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools

  • Export Citation/Save Click for help


Magnetron sputtering offers a flexible and high throughput deposition process for optical coatings. Sputtering uses two or more metal targets, depositing multilayers comprising dielectrics, metals and conductive oxides.

© 2013 OSA

OCIS Codes
(310.1860) Thin films : Deposition and fabrication
(310.3840) Thin films : Materials and process characterization
(310.6860) Thin films : Thin films, optical properties

D. Gibson, J. Martin, F. Placido, and D. Childs, "Small Batch High Throughput Plasma Activated Magnetron Sputtering System," in Optical Interference Coatings, M. Tilsch and D. Ristau, eds., OSA Technical Digest (online) (Optical Society of America, 2013), paper ThB.8.

Sort:  Journal  |  Reset


References are not available for this paper.

Supplementary Material

» Media 1: PDF (632 KB)     

OSA is a member of CrossRef.

CrossCheck Deposited