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Optics InfoBase > Conference Papers > PEMD > 2003 > AM > Page 697 © 2003 OSA

Conference Paper
Photorefractive Effects, Materials, and Devices
La Colle sur Loup France
June 17, 2003
ISBN: 1-55752-755-5
Application: Miscellaneous (AM)

Atom lithography with reection holograms in lithium-niobate crystals

K. Peithmann, M. Flaspöohler, K. Buse1, M. Müutzel, S. Tandler, D. Haubrich, and D. Meschede

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Abstract

Atom lithography uses neutral atoms, e. g. cesium, to produce small structures with nanometer resolution on wafers by transforming a light intensity pattern into a density pattern of an atomic beam. In order to achieve a 2D complex structure, two elementary holographic gratings are written in an iron-doped lithium-niobate crystal, using light with the wavelength 852 nm. Illuminating the crystal with the reference wave simultaneously reconstructs two signal waves, and these three beams interfere and create a light pattern with two dierent grating periods. This light pattern is imprinted onto a beam of cesium atoms. A characterization of the "holographic mirror" as well as the results of the atom lithography experiment are presented, and some further extensions and perspectives of this new method are discussed.

© 2003 Optical Society of America

OCIS Codes
(090.2890) Holography : Holographic optical elements
(160.3730) Materials : Lithium niobate
(220.4000) Optical design and fabrication : Microstructure fabrication

Citation
K. Peithmann, M. Flaspöohler, K. Buse1, M. Müutzel, S. Tandler, D. Haubrich, and D. Meschede, "Atom lithography with reection holograms in lithium-niobate crystals," in Photorefractive Effects, Materials, and Devices, P. Delaye, C. Denz, L. Mager, and G. Montemezzani, eds., Vol. 87 of OSA Trends in Optics and Photonics (Optical Society of America, 2003), paper 697.
http://www.opticsinfobase.org/abstract.cfm?URI=PEMD-2003-697


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