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Conference Paper
Quantum Electronics and Laser Science Conference
Baltimore, Maryland United States
May 22, 2005
ISBN: 1-55752-770-9
EUV & Soft-X-ray Sources and Applications (JThG)

Optical-Field-Ionization EUV Lasing in a Xenon Cluster Jet

Hsu-hsin Chu, Hai-En Tsai, Lan-Sheng Yang, Jiunn-Yuan Lin, Chau-Hwang Lee, Jyhpyng Wang, and Szu-yuan Chen

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An optical-field-ionization EUV laser with prepulse-controlled nanoplasma expansion in a cluster gas jet was demonstrated. Pd-like xenon lasing at 41.8-nm with 100 nJ/pulse and 5-mrad divergence was achieved, indicating near-saturation amplification.

© 2005 Optical Society of America

OCIS Codes
(140.0140) Lasers and laser optics : Lasers and laser optics
(140.7240) Lasers and laser optics : UV, EUV, and X-ray lasers
(350.0350) Other areas of optics : Other areas of optics
(350.5400) Other areas of optics : Plasmas

H. Chu, H. Tsai, L. Yang, J. Lin, C. Lee, J. Wang, and S. Chen, "Optical-Field-Ionization EUV Lasing in a Xenon Cluster Jet," in Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science and Photonic Applications Systems Technologies, Technical Digest (CD) (Optical Society of America, 2005), paper JThG5.

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