OSA's Digital Library

Optics InfoBase > Conference Papers > QELS > 2005 > JTuC > Page JTuC44 © 2005 OSA

Conference Paper
Quantum Electronics and Laser Science Conference
Baltimore, Maryland United States
May 22, 2005
ISBN: 1-55752-770-9
Poster Session I (JTuC)

Femtosecond Laser Ablation of Silicon (100) with Thermal Oxide Thin Films of Varying Thickness

Joel P. McDonald, Katherine E. Ray, Vanita R. Mistry, Gerard Mourou, and Steven M. Yalisove

View Full Text Article

Acrobat PDF (1908 KB) Note that full-text PDFs from conferences typically contain 1-3 pages of content, some or all of which might be an abstract, summary, or miscellaneous items.

Browse Journals / Lookup Meetings

Browse by Journal and Year


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools

  • Export Citation/Save Click for help


Femtosecond laser ablation of Silicon (100) with thermal oxide thin films was studied in order to further understand the ablative properties of thin films and to evaluate their influence on the ablation of the substrate.

© 2005 Optical Society of America

OCIS Codes
(160.0160) Materials : Materials
(160.2750) Materials : Glass and other amorphous materials
(310.0310) Thin films : Thin films
(310.3840) Thin films : Materials and process characterization

J. P. McDonald, K. E. Ray, V. R. Mistry, G. Mourou, and S. M. Yalisove, "Femtosecond Laser Ablation of Silicon (100) with Thermal Oxide Thin Films of Varying Thickness," in Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science and Photonic Applications Systems Technologies, Technical Digest (CD) (Optical Society of America, 2005), paper JTuC44.

Sort:  Journal  |  Reset


References are not available for this paper.

OSA is a member of CrossRef.

CrossCheck Deposited