Resonantly Enhanced Near-Field Lithography

Mankei Tsang; Demetri Psaltis; Demetri Psaltis

Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference and Photonic Applications Systems Technologies
OSA Technical Digest (CD) (Optica Publishing Group, 2008),
paper QTuG1

Resonantly Enhanced Near-Field Lithography

Mankei Tsang and Demetri Psaltis

Quantum Electronics and Laser Science Conference 2008

San Jose, California United States
4–9 May 2008
ISBN: 978-1-55752-859-9

From the session
Nanoplasmonics III (QTuG)

Not Accessible

Your library or personal account may give you access

Get PDF
Email
Share
Get Citation
Copy Citation Text
M. Tsang and D. Psaltis, "Resonantly Enhanced Near-Field Lithography," in Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference and Photonic Applications Systems Technologies, OSA Technical Digest (CD) (Optica Publishing Group, 2008), paper QTuG1.

Export Citation
- BibTex
- Endnote (RIS)
- HTML
- Plain Text
Save article

Abstract

We propose the combination of a planar optical resonator and a solid immersion lens for resonantly enhanced non-contact near-field lithography. Subwavelength small spots can be produced by exciting the Bessel modes of the resonator.

PDF Article

More Like This

Resonantly-Enhanced Single-Aperture Transmission for Near-Field Probes

Y. Pang and R. Gordon
JSV1_5 European Quantum Electronics Conference (EQEC) 2009

Numerically investigated the third-harmonic generation via tip-enhancement effect for high resolution near-field optical lithography

Ning Zhu, Hui Zhang, and Hao Li
JF2A.27 Fiber-Based Technologies and Applications (FBTA) 2014

Enhanced radiation forces in the near-field of a structured thin metallic film

A.R. Zakharian, A. Kobyakov, A. Mafi, and S.A. Darmanyan
JWA2 Frontiers in Optics (FiO) 2008

Previous Article Next Article