OSA's Digital Library

Optics InfoBase > Conference Papers > QELS > 2008 > QWA > Page QWA6 © 2008 OSA

Conference Paper
Quantum Electronics and Laser Science Conference
San Jose, California United States
May 4-9, 2008
ISBN: 978-1-55752-859-9
Plasmonic Devices and Waveguides (QWA)

Fabrication of Channel and Wedge Plasmon Polarition Devices by Combined UV and Nanoimprint Lithography

Rasmus B. Nielsen, Alexandra Boltasseva, Anders Kristensen, Sergey I. Bozhevolnyi, Valentyn Volkov, Irene Fernandez-Cuesta, and Anna Klukowska

View Full Text Article

Acrobat PDF (940 KB) Note that full-text PDFs from conferences typically contain 1-3 pages of content, some or all of which might be an abstract, summary, or miscellaneous items.

Browse Journals / Lookup Meetings

Browse by Journal and Year


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools

  • Export Citation/Save Click for help


We present a large-scale compatible fabrication method for channel and wedge plasmon polariton waveguides. Optical characterization of fabricated devices using SNOM shows sub-wavelength confinement and propagation lengths in the hundreds of microns.

© 2008 Optical Society of America

OCIS Codes
(240.0240) Optics at surfaces : Optics at surfaces
(240.6680) Optics at surfaces : Surface plasmons
(250.0250) Optoelectronics : Optoelectronics
(250.5300) Optoelectronics : Photonic integrated circuits

R. B. Nielsen, A. Boltasseva, A. Kristensen, S. I. Bozhevolnyi, V. Volkov, I. Fernandez-Cuesta, and A. Klukowska, "Fabrication of Channel and Wedge Plasmon Polarition Devices by Combined UV and Nanoimprint Lithography," in Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference and Photonic Applications Systems Technologies, OSA Technical Digest (CD) (Optical Society of America, 2008), paper QWA6.

Sort:  Journal  |  Reset


References are not available for this paper.

OSA is a member of CrossRef.

CrossCheck Deposited