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Conference Paper
Quantum Electronics and Laser Science Conference
San Jose, California United States
May 4-9, 2008
ISBN: 978-1-55752-859-9
Plasmonic Devices and Waveguides (QWA)

Fabrication of Channel and Wedge Plasmon Polarition Devices by Combined UV and Nanoimprint Lithography

Rasmus B. Nielsen, Alexandra Boltasseva, Anders Kristensen, Sergey I. Bozhevolnyi, Valentyn Volkov, Irene Fernandez-Cuesta, and Anna Klukowska

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Abstract

We present a large-scale compatible fabrication method for channel and wedge plasmon polariton waveguides. Optical characterization of fabricated devices using SNOM shows sub-wavelength confinement and propagation lengths in the hundreds of microns.

© 2008 Optical Society of America

OCIS Codes
(240.0240) Optics at surfaces : Optics at surfaces
(240.6680) Optics at surfaces : Surface plasmons
(250.0250) Optoelectronics : Optoelectronics
(250.5300) Optoelectronics : Photonic integrated circuits

Citation
R. B. Nielsen, A. Boltasseva, A. Kristensen, S. I. Bozhevolnyi, V. Volkov, I. Fernandez-Cuesta, and A. Klukowska, "Fabrication of Channel and Wedge Plasmon Polarition Devices by Combined UV and Nanoimprint Lithography," in Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference and Photonic Applications Systems Technologies, OSA Technical Digest (CD) (Optical Society of America, 2008), paper QWA6.
http://www.opticsinfobase.org/abstract.cfm?URI=QELS-2008-QWA6


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