Parametric analysis of damage probability: a tool to identify weak layers within multilayer coatings

Linas Smalakys; Gintarė Batavičiūtė; Egidijus Pupka; Andrius Melninkaitis

doi:10.1364/AO.54.002953

Applied Optics
Vol. 54,
Issue 10,
pp. 2953-2962
(2015)
•https://doi.org/10.1364/AO.54.002953

Parametric analysis of damage probability: a tool to identify weak layers within multilayer coatings

Linas Smalakys, Gintarė Batavičiūtė, Egidijus Pupka, and Andrius Melninkaitis

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Linas Smalakys, Gintarė Batavičiūtė, Egidijus Pupka, and Andrius Melninkaitis, "Parametric analysis of damage probability: a tool to identify weak layers within multilayer coatings," Appl. Opt. 54, 2953-2962 (2015)

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Abstract

The role of defects, inherent to fused silica substrate due to polishing and deposition processes, is interpreted in terms of laser-induced damage probability. Changes of damage threshold behavior are observed in bare substrate, monolayer, and multilayer coatings after irradiation with UV (355 nm) nanosecond laser pulses at different angles of incidence (0° and 45°) and polarizations (s and p). Statistical damage probability models are constructed for experimental data approximation. Effects of light intensification by standing waves within multilayer coatings and localization of the defects (surface, interface, and bulk) are considered as key factors within this work. Polishing defects are shown to be the limiting factor in the case of uncoated fused silica sample, as well as ${SiO}_{2}$ and ${HfO}_{2}$ monolayer coated substrates. The obtained results also suggest that damage threshold of almost identical sublayers constituting highly reflective multilayer ${HfO}_{2} / {SiO}_{2}$ coating with central 355 nm wavelength is a function of sublayer depth.

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Substrate	Coating Type	Coating Structure	Physical Thickness (nm)	Refractive Index at 355 nm
FS 5 mm	Uncoated	—	—	1.477
	${SiO}_{2}$	Monolayer	361	1.497
	${HfO}_{2}$	Monolayer	299	1.965
	${HfO}_{2} / {SiO}_{2}$	L ${(LH)}^{20}$	L, 59.48	L, 1.492
	${HfO}_{2} / {SiO}_{2}$	L ${(LH)}^{20}$	H, 45.49	H, 1.951

Sample	AOI (degrees), Polarization	${LIDT}^{1}$ ( $J / {cm}^{2}$ )	${LIDT}^{2}$ ( $J / {cm}^{2}$ )	${LIDT}^{3}$ ( $J / {cm}^{2}$ )	${\| E_{\max} \|}^{2}$	$T$
FS	0	25.9	25.6	24.2	0.65	0.96
FS	45, s	24.8	19.8	25.3	0.50	0.92
FS	45, p	21.5	21.3	23.0	0.54	0.99
${SiO}_{2}$	0	7.3	7.9	6.3	0.65	0.96
${SiO}_{2}$	45, s	7.1	6.3	6.1	0.50	0.90
${SiO}_{2}$	45, p	6.4	6.5	6.0	0.54	0.99
${HfO}_{2}$	0	5.4	4.7	4.1	0.57	0.84
${HfO}_{2}$	45, s	4.3	3.9	3.7	0.48	0.88
${HfO}_{2}$	45, p	4.2	4.3	3.4	0.53	0.98
HR	0	10.2	—	—	1.8, L	$1 \times 10^{- 3}$
HR	0	10.2	—	—	1.1, H	$1 \times 10^{- 3}$
HR	45, s	4.8	—	—	1.9, L	$5 \times 10^{- 3}$
HR	45, s	4.8	—	—	1.2, H	$5 \times 10^{- 3}$
HR	45, p	2.9	—	—	1.2, L	0.56
HR	45, p	2.9	—	—	0.8, H	0.56

Substrate	Coating Type	Coating Structure	Physical Thickness (nm)	Refractive Index at 355 nm
FS 5 mm	Uncoated	—	—	1.477
	${SiO}_{2}$	Monolayer	361	1.497
	${HfO}_{2}$	Monolayer	299	1.965
	${HfO}_{2} / {SiO}_{2}$	L ${(LH)}^{20}$	L, 59.48	L, 1.492
	${HfO}_{2} / {SiO}_{2}$	L ${(LH)}^{20}$	H, 45.49	H, 1.951

Sample	AOI (degrees), Polarization	${LIDT}^{1}$ ( $J / {cm}^{2}$ )	${LIDT}^{2}$ ( $J / {cm}^{2}$ )	${LIDT}^{3}$ ( $J / {cm}^{2}$ )	${\| E_{\max} \|}^{2}$	$T$
FS	0	25.9	25.6	24.2	0.65	0.96
FS	45, s	24.8	19.8	25.3	0.50	0.92
FS	45, p	21.5	21.3	23.0	0.54	0.99
${SiO}_{2}$	0	7.3	7.9	6.3	0.65	0.96
${SiO}_{2}$	45, s	7.1	6.3	6.1	0.50	0.90
${SiO}_{2}$	45, p	6.4	6.5	6.0	0.54	0.99
${HfO}_{2}$	0	5.4	4.7	4.1	0.57	0.84
${HfO}_{2}$	45, s	4.3	3.9	3.7	0.48	0.88
${HfO}_{2}$	45, p	4.2	4.3	3.4	0.53	0.98
HR	0	10.2	—	—	1.8, L	$1 \times 10^{- 3}$
HR	0	10.2	—	—	1.1, H	$1 \times 10^{- 3}$
HR	45, s	4.8	—	—	1.9, L	$5 \times 10^{- 3}$
HR	45, s	4.8	—	—	1.2, H	$5 \times 10^{- 3}$
HR	45, p	2.9	—	—	1.2, L	0.56
HR	45, p	2.9	—	—	0.8, H	0.56

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Applied Optics