Abstract

Photocatalytic TiO₂ thin film is prepared by sol-gel technique on microstructured silicon substrate produced by femtosecond laser cumulative irradiation. The photocatalytic activity is evaluated by the degradation of methylene blue (MB) solution under ultraviolet (UV) irradiation. For 6-ml MB solution with initial concentration of 3.0 × 10^-5 mol/L, the degradation rate caused by TiO₂ thin film of 2-cm² area is higher than 70% after 10-h UV irradiation. Microstructured silicon substrate is found to enhance photocatalytic activity of the TiO₂ thin film remarkably. The femtosecond laser microstructured silicon substrate is suitable to support TiO₂ thin film photocatalysts.

© 2012 Chinese Optics Letters

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