Abstract
The radio frequency magnetron sputtering method is used to prepare well-dispersed pyramidal-shaped
Ge nanoislands embedded in amorphous SiO2 sublayers of various thicknesses. The estimated size and number
density of Ge nanoislands in SiO2 sublayer thicknesses beyond 30 nm are approximately 15 nm and 1011 cm-2,
respectively. Atomic force microscopy (AFM) reveals root mean square (RMS) roughness sensitivity as the SiO2
sublayer thickness varies from 30 to 40 nm. The formation of nanoislands with high aspect ratios is attributed
to the higher rate of surface reactions between Ge adatoms and nucleated Ge islands than reactions associated
with SiO2 and Ge. The Ge nanoisland polyorientation on SiO2 (50-nm thickness) is revealed by X-ray diffraction
(XRD) patterns. Photoluminescence (PL) peaks of 2.9 and 1.65 eV observed at room temperature (RT) are
attributed to the radiative recombination of electrons and holes from the Ge nanoislands/SiO2 and SiO2/Si
interfaces, respectively. The mean island sizes are determined by fitting the experimental Raman profile to
two models, namely, the phonon confinement model and the size distribution combined with phonon confinement
model. The latter model yields the best fit to the experimental data. We confirm that SiO2 matrix thickness
variations play a significant role in the formation of Ge nanoislands mediated via the minimization of
interfacial and strain energies.
© 2013 Chinese Optics Letters
PDF Article
More Like This
Cited By
You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Login to access Optica Member Subscription