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Optica Publishing Group
  • Chinese Optics Letters
  • Vol. 11,
  • Issue 5,
  • pp. 053002-
  • (2013)

Repetition rate dependence of absorption of fused silica irradiated at 193 nm

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Abstract

Repetition rate-dependent absorbance measurements of synthetic fused silica at 193-nm irradiation are performed in the range of 50-1 000 Hz with an ArF laser calorimeter. The "apparent" single- and twophoton absorption coefficients are determined by measuring the laser fluence-dependent absorbance of fused silica samples with different thicknesses to separate the surface absorption and bulk absorption. The measurement results indicate a reversible nonlinear increase of both apparent single- and two-photon absorption coefficients with increasing repetition rate for the synthetic fused silica, whereas the surface absorption shows no dependence on the repetition rate.

© 2013 Chinese Optics Letters

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