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Optica Publishing Group
  • Chinese Optics Letters
  • Vol. 11,
  • Issue 9,
  • pp. 090802-
  • (2013)

Glass homogeneity effect on wavefront aberration in lithography projection lens

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Abstract

Analysis of glass homogeneity using the attaching interferometric data model neglects body distribution. To improve analysis accuracy, we establish the three-dimensional gradient index (GRIN) model of glass index by analyzing fused silica homogeneity distribution in two perpendicular measurement directions. Using the GRIN model, a lithography projection lens with a numerical aperture of 0.75 is analyzed. Root mean square wavefront aberration deteriorates from 0.9 to 9.65 nm and then improves to 5.9 nm after clocking.

© 2013 Chinese Optics Letters

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