Abstract
Scanning Dammann lithography (SDL) is proposed and implemented, which uses a
Dammann grating to generate multiple beams with sharp step boundary for writing
large-sized gratings efficiently. One of the most attractive advantages is that this
technique can accelerate the writing speed, e.g. 1 × 32 Dammann grating can be
32 times faster than the single laser scanning system. More importantly, the
uniformity of the multi-beams-written lines is much better than the single laser
beam scanning system in consideration of the environmental effects such as air
turbulence, thermal instability, etc. Using the SDL system, a three-port
high-efficiency beam splitter at visible wavelengths is fabricated quickly, and the
theoretical and experimental diffraction efficiencies are both higher than 90%.
Therefore, SDL should be a useful tool for fabrication of large-sized gratings.
© 2014 Chinese Optics Letters
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