Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group
  • Chinese Optics Letters
  • Vol. 3,
  • Issue S1,
  • pp. S106-S108
  • (2005)

Area-selective deposition of self-assembled monolayers on a synchrotron radiation etching pattern

Not Accessible

Your library or personal account may give you access

Abstract

Patterning of self-assembled monolayer (SAM) was demonstrated by area-selective deposition of SAMs on a pattern made by synchrotron radiation (SR) stimulated etching SiO2 thin films. The etching was conducted by exposing the SiO2 films to SR through a Co contact mask with SF6+O2 as the reaction gas. A dodecene SAM was deposited on the etched surface and an octadecyltrichlorosilane SAM was deposited on the SiO2 surface. The deposited SAMs were densely packed and well ordered, which were characterized by infrared spectroscopy, ellipsometer, and water contact angle.

© 2005 Chinese Optics Letters

PDF Article
More Like This
Direct observation of patterned self-assembled monolayers and bilayers on silica-on-silicon surfaces

Hadas Alon, Idan Bakish, Josh Nehrer, Assaf Y. Anderson, Chaim N. Sukenik, Avi Zadok, and Doron Naveh
Opt. Mater. Express 5(1) 149-162 (2015)

Effect of surface roughness on self-assembled monolayer plasmonic ruler in nonlocal regime

Ghazal Hajisalem, Qiao Min, Ryan Gelfand, and Reuven Gordon
Opt. Express 22(8) 9604-9610 (2014)

The PDMS-based microfluidic channel fabricated by synchrotron radiation stimulated etching

Tingchao He, Changshun Wang, Tsuneo Urisu, Takeshi Nagahiro, Ryugo Tero, and Rong Xia
Opt. Express 18(9) 9733-9738 (2010)

Cited By

You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All Rights Reserved