Abstract

Antimony-based bismuth-doped thin film, a new kind of super-resolution mask layer, is prepared by magnetron sputtering. The structures and optical constants of the thin films before and after annealing are examined in detail. The as-deposited film is mainly in an amorphous state. After annealing at 170-370 oC, it is converted to the rhombohedral-type of structure. The extent of crystallization increased with the annealing temperature. When the thin film is annealed, its refractive index decreased in the most visible region, whereas the extinction coefficient and reflectivity are markedly increased. The results indicate that the optical parameters of the film strongly depend on its microstructure and the bonding of the atoms.

© 2011 Chinese Optics Letters

Annealing dependence of residual stress and optical properties of TiO₂ thin film deposited by different deposition methods

Hsi-Chao Chen, Kuan-Shiang Lee, and Cheng-Chung Lee
Appl. Opt. 47(13) C284-C287 (2008)

Effect of the annealing temperature on structural, morphological, and nonlinear optical properties of TeO₂ thin films used for efficient THz generation

M. Mahendar, R. N. Vamsi Krishna, and A. K. Chaudhary
Appl. Opt. 62(10) 2394-2402 (2023)

Investigation of thermal annealing of optical properties and residual stress of ion-beam-assisted TiO₂ thin films with different substrate temperatures

Cheng-Chung Lee, Hsi-Chao Chen, and Cheng-Chung Jaing
Appl. Opt. 45(13) 3091-3096 (2006)

Optical constants of hydrogenated zinc oxide thin films

M. F. Al-Kuhaili, I. O. Alade, and S. M. A. Durrani
Opt. Mater. Express 4(11) 2323-2331 (2014)

Effects of annealing on the optical, structural, and chemical properties of TiO₂ and MgF₂ thin films prepared by plasma ion-assisted deposition

Seouk-Hoon Woo and Chang Kwon Hwangbo
Appl. Opt. 45(7) 1447-1455 (2006)