Abstract
Microholographic gratings were prepared on an aluminum oxide (<TEX>$Al_2O_3$</TEX>) surface using a 140-fs pulse at a center wavelength of 800 nm. The <TEX>$Al_2O_3$</TEX> was deposited on a silicon wafer and on indium tin oxide glass to a thickness of approximately 25 nm using an atomic layer deposition process. The silicon wafer substrate exhibited reflection-type gratings that were measured as a function of the incidence angle. The diffraction efficiency of the fabricated gratings was measured, with a maximum diffraction efficiency of 45% at an incidence angle of approximately <TEX>$30^{\circ}$</TEX>.
© 2014 Optical Society of Korea
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