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Analysis of fabrication tolerance based on uneven thickness of Su8-photo-resist

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Abstract

In this paper, we have analyzed the relationship between light propagation performance and uneven thickness of Su8-photo-resist based on EOPCB. Although spinning process is used to even the Su8-photo-resist, the obtained Su8-photo-resist is uneven, which directly affect cross-section shape of core layer. As long as we control h?[0,3???m] and a, b?[0,2???m], light propagation performance does not affected. But, it is easy to actually fabricate EOPCB.

© 2013 Optical Society of America

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