Abstract

Recording of relief phase holograms in Shipley AZ-1350 positive photoresist is investigated in this report. It is found that the use of Shipley AZ-303 developer with Shipley AZ-1350 photoresist relieves the material nonlinearity usually associated with photoresists, thereby allowing higher image readout efficiencies. The use of Shipley AZ-303 developer also provides an increase in material sensitivity. A theoretical model for positive photoresist exposure characteristics is developed and verified by empirical results. Using Shipley AZ-303 developer, a design procedure for recording useful (i.e., acceptable SNR > 25 dB, high efficiency ~3–5%, exposure sensitivity ~ a few mJ·cm⁻²) relief phase holograms in Shipley AZ-1350 positive photoresist is synthesized.

© 1974 Optical Society of America

Characteristics of a Photoresist Hologram and Its Replica

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Appl. Opt. 13(6) 1327-1336 (1974)

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Linearity and enhanced sensitivity of the Shipley AZ-1350B photoresist

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Diffraction characteristics of photoresist surface-relief gratings

M. G. Moharam, T. K. Gaylord, G. T. Sincerbox, H. Werlich, and B. Yung
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