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Multilayer optical interference coatings via glow discharge polymerization techniques

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Abstract

The incorporation of an optical-thickness monitor in the plasma reactor allows the fabrication of well tuned multilayer optical interference coatings, the variety and application range of which is constrained only by the limited number of presently known well characterized plasma polymers. The properties and deposition idiosyncracies of several plasma polymers found useful for optical thin films are discussed, and optical performance data for specific beam splitter and antireflection coating designs fabricated from available materials are presented.

© 1978 Optical Society of America

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