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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 18, Iss. 21 — Nov. 1, 1979
  • pp: 3644–3644

Intermittent characteristic curves for Kodak 649F plates at 514.5 nm

Jean J. A. Couture and R. A. Lessard  »View Author Affiliations


Applied Optics, Vol. 18, Issue 21, pp. 3644-3644 (1979)
http://dx.doi.org/10.1364/AO.18.003644


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Abstract

In a systematic study of sensitometric plate response for Kodak 649F, we have obtained various characteristic curves for intermittent exposures of laser light at 514.5 nm. Two different methods were used during the recording of specular exposures. We deduced typical values of the photographic parameters associated with these curves, many of which (TA - E; TA - logE; D - logE) are presented. The reciprocity law failure effects associated with many curves are discussed.

© 1979 Optical Society of America

Citation
Jean J. A. Couture and R. A. Lessard, "Intermittent characteristic curves for Kodak 649F plates at 514.5 nm," Appl. Opt. 18, 3644-3644 (1979)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-18-21-3644

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