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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 22, Iss. 1 — Jan. 1, 1983
  • pp: 185–189

Optical constants in the IR from thin film interference and reflectance: the reststrahlen region of muscovite mica

Edgar B. Singleton and Charles T. Shirkey  »View Author Affiliations


Applied Optics, Vol. 22, Issue 1, pp. 185-189 (1983)
http://dx.doi.org/10.1364/AO.22.000185


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Abstract

A new technique for determining the IR optical constants of materials that can be formed into thin films is presented. At a given wavelength the thickness of the film t, the index of refraction n, and the extinction coefficient k combine to produce interference effects in the film, which in turn control reflectance from the film. When reflectance is plotted vs thickness the resultant curve is a unique function of n and k. Values of n and k are determined by curve fitting. The technique is illustrated using thin films of muscovite mica, and values of n and k are reported for wave numbers from 1200 to 400 cm−1, which include the reststrahlen region of mica.

© 1983 Optical Society of America

History
Original Manuscript: August 19, 1982
Published: January 1, 1983

Citation
Edgar B. Singleton and Charles T. Shirkey, "Optical constants in the IR from thin film interference and reflectance: the reststrahlen region of muscovite mica," Appl. Opt. 22, 185-189 (1983)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-22-1-185

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