Absorption and exposure in positive photoresist

Chris A. Mack

doi:10.1364/AO.27.004913

Applied Optics
Vol. 27,
Issue 23,
pp. 4913-4919
(1988)
•https://doi.org/10.1364/AO.27.004913

Absorption and exposure in positive photoresist

Chris A. Mack

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Chris A. Mack, "Absorption and exposure in positive photoresist," Appl. Opt. 27, 4913-4919 (1988)

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Abstract

A review of the theory of absorption on microscopic and macroscopic levels is given. This theory is then applied to the absorption of UV light by diazo-type positive photoresist during exposure. A formal treatment of the properties of polychromatic light is given. Using these analyses, the effects of polychromatic exposure of a photoresist are derived. Finally, experimental verification of Beer’s law and determination of the exposure quantum efficiency of a particular photoresist is given.

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Wavelength (nm)	α_M (μm⁻¹)	C (cm²/mJ)	ϕ_T	B_E (cm²/mJ)
365	3.38	0.0118	0.373	0.0316
405	4.32	0.0292	0.651	0.0449
436	2.17	0.0133	0.548	0.0243

Resist	365 nm			405 nm			436 nm
	A (μm⁻¹)	B (μm⁻¹)	C (cm²/mJ)	A (μm⁻¹)	B (μm⁻¹)	C (cm²/mJ)	A (μm⁻¹)	B (μm⁻¹)	C (cm²/mJ)
	AZ1350J	0.955	0.275	0.013	0.934	0.053	0.023	0.579	0.037	0.016
AZ1318sfd	0.898	0.310	0.015	0.949	0.121	0.030	0.573	0.202	0.014
AZ1512	0.916	0.292	0.015	0.917	0.100	0.028	0.556	0.077	0.013
AZ4110	0.512	0.107	0.017	0.468	0.070	0.023	0.266	0.044	0.013
AZ5214	0.563	0.056	0.013	0.517	0.018	0.021	0.029	0.020	<0.001
Kodak 820	1.000	0.106	0.019	1.045	0.088	0.028	0.563	0.052	0.013
Ultramac PR64	0.982	0.252	0.020	1.026	0.064	0.029	0.536	0.041	0.014
Ultramac PR914	1.032	0.232	0.020	1.036	0.064	0.028	0.601	0.066	0.016
Utramac PR914AR	1.052	0.632	-	1.012	0.775	-	0.592	1.110	-
Shipley 1400-27	1.018	0.271	0.021	1.068	0.061	0.032	0.601	0.066	0.013
Shipley 1400-27D1	0.919	0.357	0.019	0.967	0.153	0.029	0.534	0.252	0.017
Shipley 1813	0.996	0.281	0.019	1.078	0.073	0.036	0.592	0.059	0.015
OFPR-800	0.812	0.284	0.016	0.772	0.105	0.019	0.475	0.073	0.011
OFPR-800 AR-15	0.768	0.384	0.015	0.932	0.224	0.029	0.606	0.241	0.016
EPR-5000	0.909	0.306	0.014	0.971	0.088	0.026	0.563	0.076	0.014
HPR 204	1.189	0.216	0.020	1.162	0.053	0.032	0.655	0.036	0.015
HPR 256	1.015	0.322	0.025	1.058	0.097	0.031	0.517	0.094	0.012
HPR 1182	0.787	0.157	0.018	0.802	0.035	0.027	0.458	0.031	0.014
Xanthochrome	0.639	0.597	-	0.824	0.096	0.028	0.520	0.057	0.016

Wavelength (nm)	α_M (μm⁻¹)	C (cm²/mJ)	ϕ_T	B_E (cm²/mJ)
365	3.38	0.0118	0.373	0.0316
405	4.32	0.0292	0.651	0.0449
436	2.17	0.0133	0.548	0.0243

Resist	365 nm			405 nm			436 nm
	A (μm⁻¹)	B (μm⁻¹)	C (cm²/mJ)	A (μm⁻¹)	B (μm⁻¹)	C (cm²/mJ)	A (μm⁻¹)	B (μm⁻¹)	C (cm²/mJ)
	AZ1350J	0.955	0.275	0.013	0.934	0.053	0.023	0.579	0.037	0.016
AZ1318sfd	0.898	0.310	0.015	0.949	0.121	0.030	0.573	0.202	0.014
AZ1512	0.916	0.292	0.015	0.917	0.100	0.028	0.556	0.077	0.013
AZ4110	0.512	0.107	0.017	0.468	0.070	0.023	0.266	0.044	0.013
AZ5214	0.563	0.056	0.013	0.517	0.018	0.021	0.029	0.020	<0.001
Kodak 820	1.000	0.106	0.019	1.045	0.088	0.028	0.563	0.052	0.013
Ultramac PR64	0.982	0.252	0.020	1.026	0.064	0.029	0.536	0.041	0.014
Ultramac PR914	1.032	0.232	0.020	1.036	0.064	0.028	0.601	0.066	0.016
Utramac PR914AR	1.052	0.632	-	1.012	0.775	-	0.592	1.110	-
Shipley 1400-27	1.018	0.271	0.021	1.068	0.061	0.032	0.601	0.066	0.013
Shipley 1400-27D1	0.919	0.357	0.019	0.967	0.153	0.029	0.534	0.252	0.017
Shipley 1813	0.996	0.281	0.019	1.078	0.073	0.036	0.592	0.059	0.015
OFPR-800	0.812	0.284	0.016	0.772	0.105	0.019	0.475	0.073	0.011
OFPR-800 AR-15	0.768	0.384	0.015	0.932	0.224	0.029	0.606	0.241	0.016
EPR-5000	0.909	0.306	0.014	0.971	0.088	0.026	0.563	0.076	0.014
HPR 204	1.189	0.216	0.020	1.162	0.053	0.032	0.655	0.036	0.015
HPR 256	1.015	0.322	0.025	1.058	0.097	0.031	0.517	0.094	0.012
HPR 1182	0.787	0.157	0.018	0.802	0.035	0.027	0.458	0.031	0.014
Xanthochrome	0.639	0.597	-	0.824	0.096	0.028	0.520	0.057	0.016

Abstract

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Equations (64)

Applied Optics