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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 29, Iss. 23 — Aug. 10, 1990
  • pp: 3380–3386

Experiments on annealed binary phase only filters fabricated with electron beam lithography

Myung Soo Kim and Clark C. Guest  »View Author Affiliations


Applied Optics, Vol. 29, Issue 23, pp. 3380-3386 (1990)
http://dx.doi.org/10.1364/AO.29.003380


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Abstract

A binary phase only filter is encoded using a simulated annealing algorithm to distinguish two similar characters. Characters that cannot be distinguished with conventional filter encoding methods are clearly distinguished with the annealed binary phase only filter in a computer simulation. Two binary phase only filters have been fabricated by use of electron beam lithography and chemical etching. One is an annealed binary phase only filter, and the other is a binary phase only filter encoded with a conventional method. Optical pattern recognition experiments using the filters agree well with computer simulation results.

© 1990 Optical Society of America

History
Original Manuscript: March 5, 1990
Published: August 10, 1990

Citation
Myung Soo Kim and Clark C. Guest, "Experiments on annealed binary phase only filters fabricated with electron beam lithography," Appl. Opt. 29, 3380-3386 (1990)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-29-23-3380

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