Abstract

A method is described for measuring transmittance, reflectance, and loss spectra in thin optical films. The method is applied to measure the properties of multilayer coatings of Si and SiO₂ used to make mirrors and antireflection coating in the 1.0–1.7-μm wavelength region. Mirrors with reflectance up to 99.5% with nine quarter-wavelength layers and two-layer antireflection coatings with reflectance of <0.2% have been made.

© 1990 Optical Society of America

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