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Applied Optics

Applied Optics


  • Vol. 32, Iss. 36 — Dec. 20, 1993
  • pp: 7572–7580

Photorefractive damage thresholds in Ti:LiNbO3 channel waveguides

Joseph C. Chon, Wei Feng, and Alan R. Mickelson  »View Author Affiliations

Applied Optics, Vol. 32, Issue 36, pp. 7572-7580 (1993)

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The photorefractive effect in titanium-in-diffused LiNbO3 waveguides is studied both experimentally and theoretically. Measurements of mode size and transmitted optical power as a function of input optical power are presented. The diffusion constants in the diffusion model and the unknown parameters in Kukhtarev’s model are determined from measurements of the near-field intensity profiles at low and at high intensity levels. These parameters can then be used to predict waveguide behavior as a function of the input power level. The simulated behavior closely resembles that observed experimentally. Calculated corrections for thermally induced index perturbation show that the thermal effects are higher-order corrections to the dominant photorefractive effect.

© 1993 Optical Society of America

Original Manuscript: January 11, 1993
Published: December 20, 1993

Joseph C. Chon, Wei Feng, and Alan R. Mickelson, "Photorefractive damage thresholds in Ti:LiNbO3 channel waveguides," Appl. Opt. 32, 7572-7580 (1993)

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