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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 33, Iss. 20 — Jul. 10, 1994
  • pp: 4487–4496

Wafer fault measurement by coherent optical processor

Xian Y. Cai, Frank Kvasnik, and Roy W. Blore  »View Author Affiliations


Applied Optics, Vol. 33, Issue 20, pp. 4487-4496 (1994)
http://dx.doi.org/10.1364/AO.33.004487


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Abstract

A microscope coherent optical processor based on the VanderLugt optical correlator is applied to the measurement of registration error in multilayer integrated-circuit wafers. A treatment of the effects of wafer faults on the correlation signal is given. Threshold criteria and fault-induced peak splitting of the correlation signal from reject production samples are exploited to demonstrate the easy and rapid detection of faults in partially processed integrated-circuit wafers.

© 1994 Optical Society of America

History
Original Manuscript: June 30, 1993
Revised Manuscript: January 4, 1994
Published: July 10, 1994

Citation
Xian Y. Cai, Frank Kvasnik, and Roy W. Blore, "Wafer fault measurement by coherent optical processor," Appl. Opt. 33, 4487-4496 (1994)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-33-20-4487


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References

  1. B. E. Dom, “Machine vision techniques for integrated circuit inspection,” in Machine Vision for Inspection and Measurement, H. Freeman, ed. (Academic, New York, 1989), pp. 257–282.
  2. K. Harris, P. Sandland, R. Singleton, “Wafer inspection automation: current and future needs,” Solid State Technol. 8, 199–205 (1983).
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  13. X. Y. Cai, F. Kvasnik, “Space-variant characteristics in multiple object recognition with a coherent optical processor,” J. Mod. Opt. 38, 1145–1158 (1991). [CrossRef]

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