Wafer fault measurement by coherent optical processor
Applied Optics, Vol. 33, Issue 20, pp. 4487-4496 (1994)
http://dx.doi.org/10.1364/AO.33.004487
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Abstract
A microscope coherent optical processor based on the VanderLugt optical correlator is applied to the measurement of registration error in multilayer integrated-circuit wafers. A treatment of the effects of wafer faults on the correlation signal is given. Threshold criteria and fault-induced peak splitting of the correlation signal from reject production samples are exploited to demonstrate the easy and rapid detection of faults in partially processed integrated-circuit wafers.
© 1994 Optical Society of America
Citation
Xian Y. Cai, Frank Kvasnik, and Roy W. Blore, "Wafer fault measurement by coherent optical processor," Appl. Opt. 33, 4487-4496 (1994)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-33-20-4487
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