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Applied Optics

Applied Optics


  • Vol. 33, Iss. 20 — Jul. 10, 1994
  • pp: 4487–4496

Wafer fault measurement by coherent optical processor

Xian Y. Cai, Frank Kvasnik, and Roy W. Blore  »View Author Affiliations

Applied Optics, Vol. 33, Issue 20, pp. 4487-4496 (1994)

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A microscope coherent optical processor based on the VanderLugt optical correlator is applied to the measurement of registration error in multilayer integrated-circuit wafers. A treatment of the effects of wafer faults on the correlation signal is given. Threshold criteria and fault-induced peak splitting of the correlation signal from reject production samples are exploited to demonstrate the easy and rapid detection of faults in partially processed integrated-circuit wafers.

© 1994 Optical Society of America

Original Manuscript: June 30, 1993
Revised Manuscript: January 4, 1994
Published: July 10, 1994

Xian Y. Cai, Frank Kvasnik, and Roy W. Blore, "Wafer fault measurement by coherent optical processor," Appl. Opt. 33, 4487-4496 (1994)

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