Expression of third-order effective nonlinear susceptibility for third-harmonic generation in crystals
Applied Optics, Vol. 34, Issue 27, pp. 6130-6135 (1995)
http://dx.doi.org/10.1364/AO.34.006130
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Abstract
Third-harmonic-generation processes in crystals are governed by the fourth-rank tensor (3)Xijkl, which reflects the crystal symmetry. In this case, the third-order nonlinear susceptibility tensor can be contracted to the compact matrix form (3)Xim. The matrices (3)Xim for isotropic media and all 32 crystallographic point groups are presented. With these matrices, the analytic expressions of third-order effective nonlinear susceptibility can be easily derived.
© 1995 Optical Society of America
Citation
Xue-lin Yang and Sheng-wu Xie, "Expression of third-order effective nonlinear susceptibility for third-harmonic generation in crystals," Appl. Opt. 34, 6130-6135 (1995)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-34-27-6130
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