A one-dimensional 280-nm period silicon grating designed to exhibit polarization-dependent reflection or antireflection behavior at visible wavelengths has been fabricated and tested. For normally incident 575-nm light, this grating reflects less than 3% of the incident radiation polarized perpendicular to the grating grooves and approximately 23% of the orthogonal polarization. To demonstrate the grating’s broadband characteristics, reflectance measurements are presented over the free-space wavelength range 475 nm < λ0 < 800 nm, for angles of incidence in the range 0° < θ < 40°, for polarization parallel and perpendicular to the grating grooves, and for planes of incidence parallel and perpendicular to the grooves. A description of the fabrication process is also given.
© 1998 Optical Society of America
Original Manuscript: August 13, 1997
Revised Manuscript: December 8, 1997
Published: May 1, 1998
David L. Brundrett, Thomas K. Gaylord, and Elias N. Glytsis, "Polarizing mirror/absorber for visible wavelengths based on a silicon subwavelength grating: design and fabrication," Appl. Opt. 37, 2534-2541 (1998)