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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 37, Iss. 13 — May. 1, 1998
  • pp: 2534–2541

Polarizing mirror/absorber for visible wavelengths based on a silicon subwavelength grating: design and fabrication

David L. Brundrett, Thomas K. Gaylord, and Elias N. Glytsis  »View Author Affiliations


Applied Optics, Vol. 37, Issue 13, pp. 2534-2541 (1998)
http://dx.doi.org/10.1364/AO.37.002534


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Abstract

A one-dimensional 280-nm period silicon grating designed to exhibit polarization-dependent reflection or antireflection behavior at visible wavelengths has been fabricated and tested. For normally incident 575-nm light, this grating reflects less than 3% of the incident radiation polarized perpendicular to the grating grooves and approximately 23% of the orthogonal polarization. To demonstrate the grating’s broadband characteristics, reflectance measurements are presented over the free-space wavelength range 475 nm < λ0 < 800 nm, for angles of incidence in the range 0° < θ < 40°, for polarization parallel and perpendicular to the grating grooves, and for planes of incidence parallel and perpendicular to the grooves. A description of the fabrication process is also given.

© 1998 Optical Society of America

OCIS Codes
(050.2770) Diffraction and gratings : Gratings
(260.5430) Physical optics : Polarization
(310.1210) Thin films : Antireflection coatings

History
Original Manuscript: August 13, 1997
Revised Manuscript: December 8, 1997
Published: May 1, 1998

Citation
David L. Brundrett, Thomas K. Gaylord, and Elias N. Glytsis, "Polarizing mirror/absorber for visible wavelengths based on a silicon subwavelength grating: design and fabrication," Appl. Opt. 37, 2534-2541 (1998)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-37-13-2534


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