OSA's Digital Library

Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 37, Iss. 31 — Nov. 1, 1998
  • pp: 7334–7341

Ellipsometry on sputter-deposited tin oxide films: optical constants versus stoichiometry, hydrogen content, and amount of electrochemically intercalated lithium

Jan Isidorsson, Claes G. Granqvist, Klaus von Rottkay, and Michael Rubin  »View Author Affiliations


Applied Optics, Vol. 37, Issue 31, pp. 7334-7341 (1998)
http://dx.doi.org/10.1364/AO.37.007334


View Full Text Article

Enhanced HTML    Acrobat PDF (201 KB)





Browse Journals / Lookup Meetings

Browse by Journal and Year


   


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools

Share
Citations

Abstract

Tin oxide thin films were deposited by reactive radio-frequency magnetron sputtering onto In2O3:Sn-coated and bare glass substrates. Optical constants in the 300–2500-nm wavelength range were determined by a combination of variable-angle spectroscopic ellipsometry and spectrophotometric transmittance measurements. Surface roughness was modeled from optical measurements and compared with atomic-force microscopy. The two techniques gave consistent results. The fit between experimental optical data and model results could be significantly improved when it was assumed that the refractive index of the Sn oxide varied across the film thickness. Varying the oxygen partial pressure during deposition made it possible to obtain films whose complex refractive index changed at the transition from SnO to SnO2. An addition of hydrogen gas during sputtering led to lower optical constants in the full spectral range in connection with a blueshift of the bandgap. Electrochemical intercalation of lithium ions into the Sn oxide films raised their refractive index and enhanced their refractive-index gradient.

© 1998 Optical Society of America

OCIS Codes
(120.2130) Instrumentation, measurement, and metrology : Ellipsometry and polarimetry
(120.4530) Instrumentation, measurement, and metrology : Optical constants
(310.0310) Thin films : Thin films

History
Original Manuscript: May 19, 1998
Revised Manuscript: July 29, 1998
Published: November 1, 1998

Citation
Jan Isidorsson, Claes G. Granqvist, Klaus von Rottkay, and Michael Rubin, "Ellipsometry on sputter-deposited tin oxide films: optical constants versus stoichiometry, hydrogen content, and amount of electrochemically intercalated lithium," Appl. Opt. 37, 7334-7341 (1998)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-37-31-7334

You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Log in to access OSA Member Subscription

You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Log in to access OSA Member Subscription

You do not have subscription access to this journal. Figure files are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Log in to access OSA Member Subscription

You do not have subscription access to this journal. Article level metrics are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Log in to access OSA Member Subscription

« Previous Article  |  Next Article »

OSA is a member of CrossRef.

CrossCheck Deposited