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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 37, Iss. 32 — Nov. 10, 1998
  • pp: 7568–7576

Laser direct-write gray-level mask and one-step etching for diffractive microlens fabrication

Michael R. Wang and Heng Su  »View Author Affiliations


Applied Optics, Vol. 37, Issue 32, pp. 7568-7576 (1998)
http://dx.doi.org/10.1364/AO.37.007568


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Abstract

High-efficiency diffractive optical elements can be achieved by an increase in the number of phase levels. We present a technique for laser direct-write gray-level masks on high-energy-beam–sensitive glass and one-step etching on the gray-level mask plate for the production of high-efficiency diffractive optical elements. Sixteen-phase-level diffractive microlenses and microlens arrays with a focusing efficiency of approximately 94% have been realized by use of the one-step nonphotolithographic fabrication technique.

© 1998 Optical Society of America

OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(050.1970) Diffraction and gratings : Diffractive optics
(080.3630) Geometric optics : Lenses
(220.4610) Optical design and fabrication : Optical fabrication
(350.3950) Other areas of optics : Micro-optics

History
Original Manuscript: March 13, 1998
Revised Manuscript: August 3, 1998
Published: November 10, 1998

Citation
Michael R. Wang and Heng Su, "Laser direct-write gray-level mask and one-step etching for diffractive microlens fabrication," Appl. Opt. 37, 7568-7576 (1998)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-37-32-7568


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