Abstract
The optical properties and the surface morphologies of single-ion-beam sputtering (SIBS) and dual-ion-beam sputtering (DIBS) depositions of titanium oxide films are investigated and compared. In the DIBS process, the ion-assisted deposition by the voltage of a low ion beam ranged from 50 to 300 V at a 0% and 44% oxygen percentage. Cosputtering with materials of Si, SiO2 (fused silica), and Al is also utilized in SIBS to improve amorphous-structure film. For the low-absorption and surface-roughness film, the optimum deposition condition of DIBS and postdeposition baking temperature for SIBS and DIBS are essential to the process.
© 1998 Optical Society of America
Full Article | PDF ArticleMore Like This
Wen-Hsiang Wang and Shiuh Chao
Opt. Lett. 23(18) 1417-1419 (1998)
Jean-Yee Wu and Cheng-Chung Lee
Appl. Opt. 45(15) 3510-3515 (2006)
Cheng-Chung Lee and Chien-Jen Tang
Appl. Opt. 45(36) 9125-9131 (2006)