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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 37, Iss. 7 — Mar. 1, 1998
  • pp: 1171–1176

Single- and dual-ion-beam sputter deposition of titanium oxide films

Jin-Cherng Hsu and Cheng-Chung Lee  »View Author Affiliations


Applied Optics, Vol. 37, Issue 7, pp. 1171-1176 (1998)
http://dx.doi.org/10.1364/AO.37.001171


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Abstract

The optical properties and the surface morphologies of single-ion-beam sputtering (SIBS) and dual-ion-beam sputtering (DIBS) depositions of titanium oxide films are investigated and compared. In the DIBS process, the ion-assisted deposition by the voltage of a low ion beam ranged from 50 to 300 V at a 0% and 44% oxygen percentage. Cosputtering with materials of Si, SiO2 (fused silica), and Al is also utilized in SIBS to improve amorphous-structure film. For the low-absorption and surface-roughness film, the optimum deposition condition of DIBS and postdeposition baking temperature for SIBS and DIBS are essential to the process.

© 1998 Optical Society of America

OCIS Codes
(240.0310) Optics at surfaces : Thin films
(240.5770) Optics at surfaces : Roughness
(310.0310) Thin films : Thin films

History
Original Manuscript: June 2, 1997
Revised Manuscript: October 17, 1997
Published: March 1, 1998

Citation
Jin-Cherng Hsu and Cheng-Chung Lee, "Single- and dual-ion-beam sputter deposition of titanium oxide films," Appl. Opt. 37, 1171-1176 (1998)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-37-7-1171

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