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Applied Optics

Applied Optics


  • Vol. 37, Iss. 7 — Mar. 1, 1998
  • pp: 1171–1176

Single- and dual-ion-beam sputter deposition of titanium oxide films

Jin-Cherng Hsu and Cheng-Chung Lee  »View Author Affiliations

Applied Optics, Vol. 37, Issue 7, pp. 1171-1176 (1998)

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The optical properties and the surface morphologies of single-ion-beam sputtering (SIBS) and dual-ion-beam sputtering (DIBS) depositions of titanium oxide films are investigated and compared. In the DIBS process, the ion-assisted deposition by the voltage of a low ion beam ranged from 50 to 300 V at a 0% and 44% oxygen percentage. Cosputtering with materials of Si, SiO2 (fused silica), and Al is also utilized in SIBS to improve amorphous-structure film. For the low-absorption and surface-roughness film, the optimum deposition condition of DIBS and postdeposition baking temperature for SIBS and DIBS are essential to the process.

© 1998 Optical Society of America

OCIS Codes
(240.0310) Optics at surfaces : Thin films
(240.5770) Optics at surfaces : Roughness
(310.0310) Thin films : Thin films

Original Manuscript: June 2, 1997
Revised Manuscript: October 17, 1997
Published: March 1, 1998

Jin-Cherng Hsu and Cheng-Chung Lee, "Single- and dual-ion-beam sputter deposition of titanium oxide films," Appl. Opt. 37, 1171-1176 (1998)

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  1. D. T. Wei, A. W. Louderback, “Method for fabricating multi-layer optical film,” U.S. patent4,142,958 (6March1979).
  2. J. R. Sites, P. Gilstrap, R. Rujkorakarn, “Ion beam sputter deposition of optical coating,” Opt. Eng. 22, 447–449 (1983). [CrossRef]
  3. M. Varasi, C. Misiano, L. Lasaponara, “Deposition of optical thin films by ion beam sputtering,” Thin Solid Films 117, 163–172 (1984). [CrossRef]
  4. B. E. Cole, T. J. Moravec, R. G. Ahonen, L. B. Ehlert, “Using ion sputtered optical coating as protective overcoats,” J. Vac. Sci. Technol. 2, 372–375 (1984). [CrossRef]
  5. G. Emiliani, S. Scaglone, “Properties of silicon and aluminum oxide thin films deposited by dual ion beam sputtering,” J. Vac. Sci. Technol. A 5, 1824–1827 (1987). [CrossRef]
  6. T. E. Varitimos, R. W. Tustison, “Ion beam sputtering of ZnS thin films,” Thin Solid Films 151, 27–33 (1987). [CrossRef]
  7. D. T. Wei, “Ion beam interference coating for ultralow optical loss,” Appl. Opt. 15, 2813–2816 (1989). [CrossRef]
  8. A. F. Stewart, S. Lu, M. Tehrani, C. Volk, “Ion beam sputtering of optical coatings,” in Laser-Induced Damage in Optical Materials, H. E. Bennett, L. L. Chase, A. H. Guenther, B. E. Newman, M. J. Soileau, eds., Proc. SPIE2114, 662–677 (1993). [CrossRef]
  9. D. T. Wei, H. R. Kaufman, C. C. Lee, “Ion beam sputtering,” in Thin Films for Optical Systems, F. R. Flory, ed. (Marcel Dekker, New York, (1995).
  10. C. C. Lee, D. T. Wei, J. C. Hsu, C.-H. Shen, “Influence of oxygen on some oxide films prepared by ion beam sputter deposition,” Thin Solid Films 290–291, 88–93 (1996). [CrossRef]
  11. P. Löbl, M. Hupertz, D. Mergel, “Nucleation and growth in TiO2 films prepared by sputtering and evaporation,” Thin Solid Films 251, 72–79 (1994). [CrossRef]
  12. R. S. Swanepoel, “Determination of the thickness and optical constants of amorphous silicon,” J. Phys. E 16, 1214–1221 (1983). [CrossRef]
  13. H. Oechsner, “The application of post-ionization for sputtering studies and surface or thin film analysis,” in Handbook of Ion Beam Processing Technology, J. J. Cuomo, S. M. Rossnagel, H. R. Kaufman, eds. (Noyes, Park Ridge, N.J., 1989), pp. 153–154.
  14. R. N. Castellano, “Reactive ion beam sputtering of thin films of lead, zirconium and titanium,” Thin Solid Films 46, 213–221 (1977). [CrossRef]
  15. J. R. Sites, H. Demiryont, D. B. Kerwin, “Ion beam sputter deposition of oxide films,” J. Vac. Sci. Technol. 3, 656 (1985). [CrossRef]
  16. H. Demiryont, J. R. Sites, “Effects of oxygen in ion-beam sputter deposition of titanium oxides,” J. Vac. Sci. Technol. A 2, 1457–1460 (1984). [CrossRef]
  17. L. S. Hsu, R. Rujkorakarn, J. R. Sites, C. Y. She, “Thermally induced crystallization of amorphous-titanium films,” J. Appl. Phys. 59, 3475–3480 (1986). [CrossRef]
  18. Y. Qu, T. A. Gessert, T. J. Coutts, R. Noufi, “Study of ion-beam-sputtered ZnO films as a function of deposition temperature,” J. Vac. Sci. Technol. A 12, 1507–1512 (1994). [CrossRef]
  19. C. C. Lee, J. C. Hsu, D. T. Wei, “Morphology of dual beam ion sputtered films investigated by AFM,” in Proceedings of International Conference on Metallurgical Coating and Thin Films (American Vacuum Society, New York, 1997), p. 178.

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